PHOTOSENSITIVE COMPOSITION, POLYMER, RESIN FILM, METHOD FOR PRODUCING RESIN FILM, AND ELECTRONIC COMPONENT

摘要

[Problem] To provide a photoresist material having excellent resolution. [Solution] A photosensitive composition which contains (A) a polymer that has a structural unit represented by formula (A1) and (B) a photosensitive acid generator. (In formula (A1), Ar1 represents a divalent group having an aromatic ring, wherein two bonding hands are present on the aromatic ring structure, provided that Ar1 has at least one group selected from among phenolic hydroxyl groups and a carboxyl group; and R1 represents an alkanediyl group, a divalent group having a saturated aliphatic ring, or a divalent group represented by formula (A2) -R2-Ar2-R3- (wherein Ar2 represents an arylene group; and each of R2 and R3 independently represents an alkanediyl group).)