APPARATUS AND METHOD FOR CONTINUOUS PROCESSING OF SEMICONDUCTOR WAFER

摘要

The present invention relates to an apparatus and a method for continuous processing of a semiconductor wafer, in which the apparatus comprises a plurality of chambers to process a wafer through multiple steps, one or more chambers from among the plurality of chambers comprising: a susceptor fixedly disposed to support the water during the execution of the steps; a lower housing fixedly disposed outside of the susceptor so as to form a segregated processing space on the lower part of the wafer; an upper housing moving vertically so as to create a segregated processing space on the upper part of the wafer; a turn-table provided between the upper and lower housings and having a hole for exposing the upper part of the susceptor, and rotating to transport the wafer from in between the plurality of chambers and to vertically move the wafer from the upper part of the susceptor; and a seating ring on which the wafer is seated by being inserted into the hole so as to allow a vertical removal thereof, and thus the present invention simplifies the structure of the apparatus and can reduce energy consumption.