发明名称 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING PROGRAM
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing system and a substrate processing program which can perform processing to suppress variations of chromaticity in a semiconductor light emitting device.SOLUTION: The substrate processing system has: a measurement section which measures information on a dimension to the surface of a wavelength conversion section from the placement surface of a holding fixture holding a substrate which has the wavelength conversion section including a light emitting section and a phosphor; a data processing section which acquires processing information on the thickness direction of the wavelength conversion section on the basis of the information on characteristics of the light emitted from the light emitting section and information on the dimension to the surface of the wavelength conversion section, from the placement surface of the holding fixture; and a processing section which processes the wavelength conversion section on the basis of the acquired processing information. The processing section is configured so as to process the wavelength conversion section by a tool with the edge of a blade using a single crystal diamond to reduce the thickness dimension in the wavelength conversion section of the substrate held by the holding fixture.
申请公布号 JP2014132686(A) 申请公布日期 2014.07.17
申请号 JP20140055272 申请日期 2014.03.18
申请人 TOSHIBA CORP 发明人 KAMIKITA MASAHIRO;KOIZUMI HIROSHI;NAKA TOMOMICHI;SAKURAI NAOAKI;KOIKE EIJIRO
分类号 H01L33/50;H01L21/02;H01L21/66;H01L33/00 主分类号 H01L33/50
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