| 主权项 |
1. An apparatus for producing extreme ultra-violet (EUV) light, comprising:
a plate including a first plurality of through-bores, each through-bore included in the first plurality of through-bores including a respective longitudinal axis; a plurality of discharge plasma devices, each discharge plasma device at least partially disposed in a respective through-bore included in the first plurality of through-bores and including:
a respective plasma electrode at least partially forming a respective plasma-producing region;a respective magnetic core embedded in the plate and aligned with at least a portion of the respective plasma electrode in a radial direction and configured to create a respective magnetic field within the respective plasma-producing region; and,a respective feed system arranged to supply an ionizable material to the respective plasma-producing region; and, at least one power system configured to supply electrical power to the respective plasma electrodes to create respective first electric fields in the respective plasma-producing regions, wherein:
for said each discharge plasma device, the combination of a respective first electric field and the respective magnetic field is arranged to create a respective plasma from the ionizable material, the respective plasma creating respective EUV light. |
