发明名称 HIGH MOBILITY FILM THROUGH QUANTUM CONFINEMENT USING METAL OXYNITRIDES AND OXIDES
摘要 <p>The present invention generally relates to a thin film semiconductor device having multiple semiconductor layers. The layers can be tailored such that the Fermi level and the charge neutrality level are different in the layers. By tailoring the layers, the electron trapping location can be selected so that the thin film semiconductor device has high mobility. While description will be made with reference to a TFT, it is to be understood that the invention has broader utility, such as with any thin film semiconductor device.</p>
申请公布号 WO2014109827(A1) 申请公布日期 2014.07.17
申请号 WO2013US70024 申请日期 2013.11.14
申请人 APPLIED MATERIALS, INC. 发明人 YE, YAN
分类号 H01L27/115;H01L29/78 主分类号 H01L27/115
代理机构 代理人
主权项
地址