| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology enabling the production of an active light-sensitive or a radiation-sensitive resin containing a recurring unit including a structural part decomposed by the irradiation of the active light or radiation to produce an acid, and a recurring unit including a group decomposed by the acid to produce an alkali-dissolvable group, in a high purity. <P>SOLUTION: This method for producing the active light-sensitive or radiation-sensitive resin is provided by comprising the polymerization of a reaction system containing a first monomer including the structural part generating the acid by the decomposition with the irradiation of the active light or radiation and a second monomer including the group decomposed by the action of the acid to form the alkali-dissolvable group, in the presence of a basic compound. <P>COPYRIGHT: (C)2011,JPO&INPIT |
