| 摘要 |
<p>The present invention provides a mask and an ion beam irradiation device using the same which can easily control the amount of irradiation uniformity of the end or size of an area whereby the uniformity is maintained with a simple composition. If the mask is a beam progressing direction of an ion beam, the mask comprises; a first shielding unit (51) which is extended to a long side direction from a short side direction of a side of a beam cross section and shields a portion of the cross section; and a second shielding unit (52) which is extended to the long side direction from the short side direction of a side of the beam cross section and is installed in the short side direction at the beam cross section regarding the first shielding unit (51) and shields the other portion excluding the portion which is shielded by the first shielding unit (51). A shielding amount of the ion beam by the first shielding unit (51) is different with a shielding amount of the ion beam (IB) by the second shielding unit (52).</p> |
