| 摘要 |
<p>The present invention provides a plasma generation apparatus that is able to efficiently output a large amount of functional metal material particle gas, which is used for forming a functional insulating film on a processing object material. A plasma generation apparatus 100 according to the present invention includes an electrode cell and a housing (16) that encloses the electrode cell. The electrode cell includes a first electrode (3), a discharge space (6), a second electrode (1), dielectrics (2a ,Pb), and a pass-through (PH) formed in a central portion in a plan view. An insulating tube (21) having a cylindrical shape is arranged within the pass-through (PH). Ejection holes (21x) are formed in a side surface of the cylindrical shape. The plasma generation apparatus (100) further includes a precursor supply part (201) that is connected to a hollow portion (21A) of the insulating tube (21) and configured to supply a metal precursor.</p> |
