发明名称 Capacitive sensor integrated onto semiconductor circuit
摘要 There is disclosed a capacitive sensor on a passivation layer of a semiconductor circuit such as an ASIC, and a method for manufacturing such sensor. The system and method may comprise: forming a bottom electrode layer and landing pad (520) on a portion of the passivation layer located over active circuitry of the ASIC; forming a gas sensitive layer (530) onto the bottom electrode layer and the landing pad; creating a via (540) through the gas sensitive layer to expose a portion of the landing pad; forming a top electrode layer (550) onto the gas sensitive layer, wherein the top electrode layer completely overlays a surface area of the bottom electrode layer, and wherein the forming process for the top electrode layer deposits a portion of the top electrode layer into the via hole, thereby forming an electrical connection between the top electrode layer and the landing pad.
申请公布号 EP2755023(A1) 申请公布日期 2014.07.16
申请号 EP20130305026 申请日期 2013.01.11
申请人 MEAS FRANCE 发明人 GUILLEMET, JEAN-PAUL;DRLJACA, PREDRAG;BEELER, DANIEL;GALLORINI, ROMUALD;DUCERE, VINCENT
分类号 G01N27/22 主分类号 G01N27/22
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