Device and method for forming thin film pattern

摘要

The present invention provides device and method for forming a thin film pattern which can maintain an extent of wetting of a printing liquid at a proper state without time dependence. The device for forming a thin film includes a printing liquid supply unit for supplying printing liquid, a cliché having a depressed pattern and a relieved pattern for patterning the printing liquid, a printing roller for having the printing liquid supplied from the printing liquid supply unit thereto coated thereon and being rolled on the cliché and the substrate, and a solvent supply unit for supplying a solvent to the printing liquid before the printing liquid coated on the printing roller is brought into contact with the cliché.

主权项

1. A method for forming a thin film pattern comprising the steps of:
coating and drying a printing liquid on a printing roller; supplying a solvent to the printing liquid coated on the printing roller by using a solvent supply unit before the printing roller is rolled on a cliché having a depressed pattern and a relieved pattern, wherein the solvent is mixed with the printing liquid to maintain viscosity of the printing liquid within an allowable range; patterning the printing liquid by rolling the printing roller on the cliché; and transcribing a thin film pattern formed by patterning thus to a substrate, wherein the step of supplying a solvent to the printing liquid includes the steps of: providing a liquid container having the solvent stored therein; and supplying the solvent from the liquid container to the printing liquid by using first and second supply rollers, and wherein the first solvent supply roller supplies the solvent to the printing liquid, and the second solvent supply roller rotates engaged with the first solvent supply roller to transfer the solvent from the liquid container to the first solvent supply roller.