发明名称 |
TIN-CONTAINING ALLOY PLATING BATH, ELECTROPLATING METHOD USING SAME, AND SUBSTRATE WITH THE ELECTROPLATING DEPOSITED THEREON |
摘要 |
<p>Provided are a tin-containing alloy plating bath being capable of manufacturing a tin-containing alloy plated product suitable for electric and electronic members with excellent anti-oxidation performance, and an electroplating method using the bath. Specifically the bath is a plating bath to deposit a tin-containing alloy on the surface of a substrate, which plating bath contains: (a) a tin compound containing 99.9% by mass to 46% by mass of tin based on entire metal mass in the plating bath; (b) a gadolinium compound containing 0.1% by mass to 54% by mass of gadolinium based on entire metal mass in the plating bath; (c) at least one complexing agent; and (d) a solvent, and the electroplating method uses the tin-containing alloy bath, thus can manufacture a tin-containing alloy plated product having excellent anti-oxidation performance.</p> |
申请公布号 |
CA2769569(C) |
申请公布日期 |
2014.07.15 |
申请号 |
CA20092769569 |
申请日期 |
2009.07.31 |
申请人 |
M-TECH JAPAN CO., LTD.;DEWAKI, KENJI;DEWAKI, SHINJI |
发明人 |
DEWAKI, KENJI;DEWAKI, SHINJI;MATSUURA, TERU |
分类号 |
C25D3/60 |
主分类号 |
C25D3/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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