| 发明名称 | Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus | ||
| 摘要 | A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction. | ||
| 申请公布号 | US8781775(B2) | 申请公布日期 | 2014.07.15 |
| 申请号 | US201113018226 | 申请日期 | 2011.01.31 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Butler Hans;Eussen Emiel Jozef Melanie;Koenen Willem Herman Gertruda Anna;Van Der Pasch Engelbertus Antonius Fransiscus;Van Der Schoot Harmen Klaas;Van Der Wijst Marc Wilhelmus Maria;Vermeulen Marcus Martinus Petrus Adrianus;De Hoon Cornelius Adrianus Lambertus |
| 分类号 | G01C17/38 | 主分类号 | G01C17/38 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic apparatus comprising: a stage configured to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure configured to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage, and the stage being moveable over the magnet structure; a first position measurement system configured to provide a first measurement signal corresponding to a position of the stage, or the object, or both the stage and the object, in a measurement direction relative to the reference structure; a second position measurement system configured to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor configured to correct the first measurement signal with a value which is dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage, or the object, or both the stage and the object, relative to the reference structure in the measurement direction. | ||
| 地址 | Veldhoven NL | ||