Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector

摘要

There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.

主权项

1. An electron beam detector comprising:
a shield plate having a plurality of openings including a support of the shield plate formed into flat plate shape and a shield film supported by the support of the shield plate; a scatterer arranged in parallel with the shield plate, including a support of the scatterer formed into flat plate shape which includes a plurality of openings formed at portions corresponding to the plurality of openings of the shield plate, and a scatterer film formed on the support of the scatterer and configured to scatter electron beam passed through the shield plate; and a beam detection element formed into flat plate shape and arranged in parallel with the shield plate, disposed at a predetermined distance from the scatterer and configured to convert the electron beam passed through the scatterer into an electric signal.