| 发明名称 | Apparatus and method for generating extreme ultra violet radiation | ||
| 摘要 | An apparatus and a method for generating extreme ultra violet radiation are provided. The apparatus for generating extreme ultra violet radiation includes a light source, a first reflecting mirror on which source light emitted from the light source is incident, a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident, a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror, and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident. | ||
| 申请公布号 | US8779403(B2) | 申请公布日期 | 2014.07.15 |
| 申请号 | US201314103381 | 申请日期 | 2013.12.11 |
| 申请人 | Samsung Electronics Co., Ltd.;Fine Semitech Corp. | 发明人 | Lee Dong-Gun;Kim Eok-Bong;Park Jong-Ju;Kim Seong-Sue |
| 分类号 | G01J1/42 | 主分类号 | G01J1/42 |
| 代理机构 | Lee & Morse, P.C. | 代理人 | Lee & Morse, P.C. |
| 主权项 | 1. An apparatus for generating extreme ultra violet radiation, the apparatus comprising: a light source; a first reflecting mirror on which source light emitted from the light source is incident; a second reflecting mirror on which first reflected light reflected by the first reflecting mirror is incident; a focus mirror on which second reflected light reflected by the second reflecting mirror is incident, the focus mirror reflecting third reflected light back to the second reflecting mirror; and a gas cell on which fourth reflected light reflected by the second reflecting mirror is incident. | ||
| 地址 | Suwon-si, Gyeonggi-do KR | ||