Substrate cover and charged particle beam writing method using same

摘要

A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.

主权项

1. A substrate cover positioned on a substrate wherein a charged particle beam will write a pattern on the substrate, the substrate cover comprising:
a conductive portion being larger in outer dimension than an outer peripheral end of the substrate, which has an opening in a center thereof in a size smaller than the outer peripheral end of the substrate, and a translucent portion provided in at least part of an inner peripheral edge portion around the opening of the conductive portion, wherein a gap leading to leakage of the charged particle beam thereof between the translucent portion and a portion other than the translucent portion is filled with a member designed for filling in the gap, and wherein the translucent portion is configured to have light penetrate therethrough and the light irradiates an edge of the substrate for detecting an edge position of the substrate.