发明名称 Fabrication of graphene electronic devices using step surface contour
摘要 A method for fabricating an electronic component, comprising providing a substrate; and depositing a graphene layer; wherein the substrate is either provided with a van-der-Waals functional layer or a van-der-Waals functional layer is deposited on the substrate before depositing the graphene layer; a surface step contour is formed; and growth of the graphene layer is seeded at the step contour.
申请公布号 US8778782(B2) 申请公布日期 2014.07.15
申请号 US201113306031 申请日期 2011.11.29
申请人 IHP GmbH—Innovations for High Performance Microelectronics 发明人 Lippert Gunther;Dabrowski Jaroslaw;Lupina Grzegorz;Seifarth Olaf
分类号 H01L21/36 主分类号 H01L21/36
代理机构 代理人
主权项 1. A method for fabricating an electronic component, comprising: providing a substrate and a plurality of surface step contours on the substrate; and depositing a van der Waals layer adjacent to the surface step contours; and depositing a graphene layer on the van der Waals layer; wherein growth of the graphene layer is seeded at a kink of the surface step contours.
地址 Frankfurt DE