发明名称 |
Fabrication of graphene electronic devices using step surface contour |
摘要 |
A method for fabricating an electronic component, comprising providing a substrate; and depositing a graphene layer; wherein the substrate is either provided with a van-der-Waals functional layer or a van-der-Waals functional layer is deposited on the substrate before depositing the graphene layer; a surface step contour is formed; and growth of the graphene layer is seeded at the step contour. |
申请公布号 |
US8778782(B2) |
申请公布日期 |
2014.07.15 |
申请号 |
US201113306031 |
申请日期 |
2011.11.29 |
申请人 |
IHP GmbH—Innovations for High Performance Microelectronics |
发明人 |
Lippert Gunther;Dabrowski Jaroslaw;Lupina Grzegorz;Seifarth Olaf |
分类号 |
H01L21/36 |
主分类号 |
H01L21/36 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for fabricating an electronic component, comprising:
providing a substrate and a plurality of surface step contours on the substrate; and depositing a van der Waals layer adjacent to the surface step contours; and depositing a graphene layer on the van der Waals layer; wherein growth of the graphene layer is seeded at a kink of the surface step contours. |
地址 |
Frankfurt DE |