发明名称 Method of manufacturing high resolution organic thin film pattern
摘要 A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer on a substrate; selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a solvent, and forming the remaining second organic layer as a second organic layer pattern.
申请公布号 US8778600(B2) 申请公布日期 2014.07.15
申请号 US201012979260 申请日期 2010.12.27
申请人 Samsung Display Co., Ltd.;SNU R&DB Foundation 发明人 Suh Min-Chul;Lee Sin-Doo;Choi Won-Suk;Kim Min-Hoi
分类号 G03F7/26 主分类号 G03F7/26
代理机构 Knobbe, Martens, Olson & Bear, LLP 代理人 Knobbe, Martens, Olson & Bear, LLP
主权项 1. A method of forming an organic thin film pattern, the method comprising: forming a first organic layer comprising a fluorine-based polymer on a substrate; removing a part of the first organic layer by irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a water-free fluorine-based solvent, and forming the remaining second organic layer as a second organic layer pattern.
地址 Yongin, Gyeonggi-Do KR