发明名称 |
Method of manufacturing high resolution organic thin film pattern |
摘要 |
A method of forming a high resolution organic thin film pattern, the method including forming a first organic layer on a substrate; selectively removing the first organic layer by selectively irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a solvent, and forming the remaining second organic layer as a second organic layer pattern. |
申请公布号 |
US8778600(B2) |
申请公布日期 |
2014.07.15 |
申请号 |
US201012979260 |
申请日期 |
2010.12.27 |
申请人 |
Samsung Display Co., Ltd.;SNU R&DB Foundation |
发明人 |
Suh Min-Chul;Lee Sin-Doo;Choi Won-Suk;Kim Min-Hoi |
分类号 |
G03F7/26 |
主分类号 |
G03F7/26 |
代理机构 |
Knobbe, Martens, Olson & Bear, LLP |
代理人 |
Knobbe, Martens, Olson & Bear, LLP |
主权项 |
1. A method of forming an organic thin film pattern, the method comprising:
forming a first organic layer comprising a fluorine-based polymer on a substrate; removing a part of the first organic layer by irradiating light energy onto the first organic layer, and forming a remaining part of the first organic layer as a sacrifice layer; forming a second organic layer on the substrate and the entire surface of the sacrifice layer; and lifting off the second organic layer formed on the sacrifice layer by removing the sacrifice layer using a water-free fluorine-based solvent, and forming the remaining second organic layer as a second organic layer pattern. |
地址 |
Yongin, Gyeonggi-Do KR |