Positive resist composition and patterning process,申请号US201213404824-传众专利搜索

发明名称	Positive resist composition and patterning process
摘要	A positive resist composition based on a polymer comprising recurring units of (meth)acrylate having a cyclic acid labile group and a dihydroxynaphthalene novolak resin, and containing a photoacid generator is improved in resolution, step coverage and adhesion on a highly reflective stepped substrate, has high resolution, and forms a pattern of good profile and minimal edge roughness through exposure and development.
申请公布号	US8778592(B2)	申请公布日期	2014.07.15
申请号	US201213404824	申请日期	2012.02.24
申请人	Shin-Etsu Chemical Co., Ltd.	发明人	Hatakeyama Jun;Nagata Takeshi;Morisawa Taku
分类号	G03F7/004;G03F7/039;G03F7/26	主分类号	G03F7/004
代理机构	Westerman, Hattori, Daniels & Adrian, LLP	代理人	Westerman, Hattori, Daniels & Adrian, LLP
主权项	1. A positive resist composition comprising a polymer comprising recurring units (a) of (meth)acrylate having a carboxyl group substituted with an acid labile group of cyclic structure, represented by the general formula (1) below, and recurring units (b) having an adhesive group selected from the group consisting of hydroxyl, carboxyl, lactone ring, carbonate, thiocarbonate, carbonyl, cyclic acetal, ether, ester, sulfonic acid ester, cyano, and amide groups, copolymerized therewith, wherein “a” and “b” indicative of molar ratios of the respective units are in the range: 0<a<1.0, 0<b<1.0, and 0.2≦a+b≦1.0, the polymer having a weight average molecular weight of 1,000 to 500,000, and a novolak resin as base resin, and a photoacid generator,wherein R1 is hydrogen or methyl, X is a single bond, a linking group of 1 to 12 carbon atoms containing at least one member selected from among an ester moiety, ether moiety and lactone ring, or a naphthylene group, and R2 is an acid labile group of cyclic structure, the novolak resin being one selected from the group consisting of the following formulae:
地址	Tokyo JP