发明名称 Semiconductor device
摘要 A semiconductor device, comprising: a substrate; a plurality of gate finger electrodes which are arranged on the substrate; a plurality of source finger electrodes which are arranged on the substrate, each source finger electrode is close to the gate finger electrode; a plurality of drain finger electrodes which are arranged on the substrate, each drain finger electrode faces the source finger electrode via the gate finger electrode; a shield plate electrode which is arranged via an insulating layer over the drain finger electrode and the first surface of the substrate between the gate finger electrode and the drain finger electrode, is short-circuited to the source finger electrode, and shields electrically the gate finger electrode and the drain finger electrode from each other; and a slot VIA hole which is formed in the substrate under the source finger electrode and is connected to the source finger electrode.
申请公布号 US8779470(B2) 申请公布日期 2014.07.15
申请号 US201313777048 申请日期 2013.02.26
申请人 Kabushiki Kaisha Toshiba 发明人 Yamamura Takuji
分类号 H01L31/0328;H01L31/0336;H01L31/072;H01L31/109 主分类号 H01L31/0328
代理机构 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P. 代理人 Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
主权项 1. A semiconductor device, comprising: a substrate; a gate electrode which is arranged on a first surface of the substrate and has a plurality of gate finger electrodes; a source electrode which is arranged on the first surface of the substrate and has a plurality of source finger electrodes, the source finger electrode is close to the gate finger electrode; a drain electrode which is arranged on the first surface of the substrate and has a plurality of drain finger electrodes, the drain finger electrode faces the source finger electrode via the gate finger electrode; an insulating layer which covers the gate finger electrode, the substrate between the gate finger electrode and the source finger electrode, the substrate between the gate finger electrode and the drain finger electrode, at least a part of the source finger electrode, and at least a part of the drain finger electrode; a shield plate electrode which is arranged via the insulating layer over the drain finger electrode and the first surface of the substrate between the gate finger electrode and the drain finger electrode, is short-circuited to the source finger electrode, and shields electrically the gate finger electrode and the drain finger electrode from each other; a gate terminal electrode which is arranged on the first surface of the substrate and is connected to a plurality of the gate finger electrodes; a drain terminal electrode which is arranged on the first surface of the substrate and is connected to a plurality of the drain finger electrodes; a slot VIA hole which is formed in the substrate under the source finger electrode and is connected to the source finger electrode; and a shield plate short circuit line which connects the shield plate electrode and the source finger electrode.
地址 Tokyo JP
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