发明名称 |
Starting structure and protection component comprising such a starting structure |
摘要 |
A structure for starting a semiconductor component including a porous silicon layer in the upper surface of a semiconductor substrate. This porous silicon layer is contacted, on its upper surface side, by a metallization and, on its lower surface side, by a heavily-doped semiconductor region. |
申请公布号 |
US8779464(B2) |
申请公布日期 |
2014.07.15 |
申请号 |
US201213448670 |
申请日期 |
2012.04.17 |
申请人 |
STMicroelectronics (Tours) SAS |
发明人 |
Menard Samuel |
分类号 |
H01L29/87;H01L29/74;H01L33/00 |
主分类号 |
H01L29/87 |
代理机构 |
Wolf, Greenfield & Sacks, P.C. |
代理人 |
Wolf, Greenfield & Sacks, P.C. |
主权项 |
1. A semiconductor device comprising:
a first structure, the first structure comprising a p-type porous silicon layer arranged between two conductive regions, wherein a lower surface side of the porous silicon layer is contacted by a heavily-doped p-type semiconductor region and an upper surface side of the porous silicon layer is directly contacted by a metallization region; and a second structure, the second structure comprising a thyristor, wherein at least a portion of the thyristor is configured to turn on when a voltage applied across the porous silicon layer exceeds a threshold voltage. |
地址 |
Tours FR |