发明名称 Starting structure and protection component comprising such a starting structure
摘要 A structure for starting a semiconductor component including a porous silicon layer in the upper surface of a semiconductor substrate. This porous silicon layer is contacted, on its upper surface side, by a metallization and, on its lower surface side, by a heavily-doped semiconductor region.
申请公布号 US8779464(B2) 申请公布日期 2014.07.15
申请号 US201213448670 申请日期 2012.04.17
申请人 STMicroelectronics (Tours) SAS 发明人 Menard Samuel
分类号 H01L29/87;H01L29/74;H01L33/00 主分类号 H01L29/87
代理机构 Wolf, Greenfield & Sacks, P.C. 代理人 Wolf, Greenfield & Sacks, P.C.
主权项 1. A semiconductor device comprising: a first structure, the first structure comprising a p-type porous silicon layer arranged between two conductive regions, wherein a lower surface side of the porous silicon layer is contacted by a heavily-doped p-type semiconductor region and an upper surface side of the porous silicon layer is directly contacted by a metallization region; and a second structure, the second structure comprising a thyristor, wherein at least a portion of the thyristor is configured to turn on when a voltage applied across the porous silicon layer exceeds a threshold voltage.
地址 Tours FR