Method for manufacturing a heterostructure aiming at reducing the tensile stress condition of a donor substrate

摘要

A method for manufacturing a heterostructure for applications in the fields of electronics, photovoltaics, optics or optoelectronics, by implanting atomic species in a donor substrate so as to form an embrittlement area therein, assembling a receiver substrate on the donor substrate, wherein the receiver substrate has a larger thermal expansion coefficient than that of the donor substrate, detaching a rear portion of the donor substrate along the embrittlement area so as to transfer a thin layer of interest of the donor substrate onto the receiver substrate, and applying a detachment annealing after assembling and but before detaching, in order to facilitate the detaching. The detachment annealing includes the simultaneous application of a first temperature to the donor substrate and a second temperature different from the first to the receiver substrate; with the first and second temperatures being selected to reduce the tensile stress condition of the donor substrate.

主权项

1. A method for manufacturing a heterostructure for applications in the field of electronics, photovoltaics, optics or optoelectronics, which comprises:
implanting atomic species in a donor substrate so as to form an embrittlement area therein, assembling a receiver substrate on the donor substrate, wherein the receiver substrate has a larger thermal expansion coefficient than that of the donor substrate, detaching a rear portion of the donor substrate along the embrittlement area so as to transfer a thin layer of interest of the donor substrate onto the receiver substrate, and applying a detachment annealing after assembling but before detaching, in order to facilitate the detaching, wherein the detachment annealing comprises the simultaneous application of a first temperature to the donor substrate and a second temperature different from the first temperature to the receiver substrate, wherein the first temperature is approximately 300° C., while the second temperature is approximately 80° C.