发明名称 |
Structure designs and methods for integrated circuit alignment |
摘要 |
Devices and methods for pattern alignment are disclosed. In one embodiment, a semiconductor device includes a die including an integrated circuit region, an assembly isolation region around the integrated circuit region, and a seal ring region around the assembly isolation region. The device further includes a die alignment mark disposed within the seal ring region or the assembly isolation region. |
申请公布号 |
US8779556(B2) |
申请公布日期 |
2014.07.15 |
申请号 |
US201113117549 |
申请日期 |
2011.05.27 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chen Hsien-Wei |
分类号 |
H01L23/544 |
主分类号 |
H01L23/544 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A semiconductor device, comprising:
a die including an integrated circuit region, an assembly isolation region around the integrated circuit region, and a seal ring region around the assembly isolation region; and a plurality of die alignment marks disposed within the seal ring region or the assembly isolation region, wherein the plurality of die alignment marks disposed within the seal ring region are alternately disposed adjacent an outer edge of the seal ring region and an inner edge of the seal ring region. |
地址 |
Hsin-Chu TW |