发明名称 Insulated gate semiconductor device
摘要 A gate lead wiring and an electrical conductor connecting the gate lead wiring to a protective diode are arranged in a straight line without bending along one and the same side of the chip. A first gate electrode layer extending on the gate lead wiring and the electrical conductor, which connects them to the protective diode, has one bent portion or no bent portion. Further, the protective diode is arranged adjacent to the electrical conductor or the gate lead wiring, and a portion of the protective diode is arranged in close proximity to a gate pad portion.
申请公布号 US8779507(B2) 申请公布日期 2014.07.15
申请号 US201213435833 申请日期 2012.03.30
申请人 Semiconductor Components Industries, LLC 发明人 Miyata Takuji;Takenaka Kazumasa
分类号 H01L29/66;H01L29/41;H01L29/423;H01L29/739 主分类号 H01L29/66
代理机构 Patents on Demand, P.A. 代理人 Patents on Demand, P.A. ;Garrett Scott M.;Buchheit Brian K.
主权项 1. An insulated gate semiconductor device comprising: a first semiconductor layer of a first general conductivity type; a channel layer of a second general conductivity type disposed on the first semiconductor layer; a plurality of first trenches extending in a first direction in the plan view of the semiconductor device, the first trenches penetrating through the channel layer and reaching the first semiconductor layer; a plurality of second trenches extending in a second direction in the plan view, each of the second trenches connecting a corresponding pair of first trenches in the plan view; a first insulating film provided on inner walls of the first trenches and the second trenches; a gate electrode disposed in the first trenches and the second trenches; a second insulating film covering the gate electrode; a source region of the first general conductivity type formed in a surface portion of the channel layer, the source region extending in the second direction in the plan view; and a body region of the second general conductivity type formed in a surface portion of the channel layer so as to be in contact with the source region and a corresponding first trench; wherein two of the first trenches and two of the second trenches define a cell which makes transistor operation possible, and the cell comprises two body regions of the second general conductivity type formed in a surface portion of the channel layer.
地址 Phoenix AZ US