发明名称 Solid-state image pickup element and image pickup apparatus
摘要 Disclosed herein is a solid-state image pickup element, including: a photoelectric conversion region; a transistor; an isolation region of a first conductivity type configured to isolate the photoelectric conversion region and the transistor from each other; a well region of the first conductivity type having the photoelectric conversion region, the transistor, and the isolation region of the first conductivity type formed therein; a contact portion configured to supply an electric potential used to fix the well region to a given electric potential; and an impurity region of the first conductivity type formed so as to extend in a depth direction from a surface of the isolation region of the first conductivity type in the isolation region of the first conductivity type between the contact portion and the photoelectric conversion region, and having a sufficiently higher impurity concentration than that of the isolation region of the first conductivity type.
申请公布号 US8780247(B2) 申请公布日期 2014.07.15
申请号 US201113053427 申请日期 2011.03.22
申请人 Sony Corporation 发明人 Yamakawa Shinya
分类号 H04N3/14;H04N5/335;H01L31/062;H01L31/113 主分类号 H04N3/14
代理机构 Dentons US LLP 代理人 Dentons US LLP
主权项 1. A solid-state image pickup element with a plurality of pixels, comprising, for at least one pixel: a photoelectric conversion region; at least one transistor; an isolation region of a first conductivity type configured to isolate said photoelectric conversion region and said at least one transistor from each other; a well region of the first conductivity type having said photoelectric conversion region, said at least one transistor, and said isolation region of the first conductivity type formed therein; a contact portion on said isolation region of the first conductivity type configured to supply an electric potential used to fix said well region of the first conductivity type to a given electric potential; and an impurity region of the first conductivity type extending in a depth direction from a surface of said isolation region of the first conductivity type in said isolation region of the first conductivity type between said contact portion and said photoelectric conversion region, and having a sufficiently higher impurity concentration than that of said isolation region of the first conductivity type.
地址 Tokyo JP