发明名称 HIGH ELECTRON MOBILITY TRANSISTOR AND METHOD OF FORMING THE SAME
摘要 A high electron mobility transistor (HEMT) includes a first III-V compound layer having a first band gap, and a second III-V compound layer having a second band gap over the first III-V compound layer. The second band gap is smaller than the first band gap. The HEMT further includes a third III-V compound layer having a third band gap over the second III-V compound layer, wherein the third band gap is greater than the first band gap. A gate electrode is formed over the third III-V compound layer. A source region and a drain region are over the third III-V compound layer and on opposite sides of the gate electrode.
申请公布号 KR20140089280(A) 申请公布日期 2014.07.14
申请号 KR20130042750 申请日期 2013.04.18
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHIANG CHEN HAO;LIU PO CHUN;CHIU HAN CHIN;CHEN CHI MING;YU CHUNG YI
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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