Manufacturing method of High density Target, utilizing waste Targets consisting of Gallium Oxide and Indium Oxide

摘要

The present invention relates to a method for simply manufacturing a high density sputtering target in a high recovery rate by recycling a water target comprised of gallium oxide and indium oxide used for conductive element materials for display and applying only dry processes without wet dissolution processes. Moreover, the preset invention relates to a method for manufacturing a target in lower sintering temperature in comparison with an existing method by manufacturing the target by using a sintering aid.