发明名称 METAL ROUTING ARCHITECTURE FOR INTEGRATED CIRCUITS
摘要 A device includes a substrate, a metal pad over the substrate, and a metal trace electrically disconnected from the metal pad. The metal pad and the metal trace are level with each other. A passivation layer includes a portion overlapping an edge portion of the metal pad. A metal pillar is overlying the metal pad, and is electrically connected to the metal pad. The metal trace has a portion overlapped by the metal pillar.
申请公布号 KR20140089283(A) 申请公布日期 2014.07.14
申请号 KR20130065638 申请日期 2013.06.10
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 CHUANG CHITA;CHUANG YAO CHUN;CHEN CHIH HUA;KUO CHEN CHENG;CHEN CHEN SHIEN
分类号 H01L21/60;H01L23/488 主分类号 H01L21/60
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