| 摘要 |
An embodiment of the present invention provides an apparatus and a method for processing a substrate by supplying a chemical solution. The apparatus for supplying a chemical solution includes a main supply unit including a buffer tank for temporarily storing the chemical solution therein and a main supply line connecting the buffer tank to a nozzle, and to supply the solution to the nozzle; an auxiliary supply unit to supply the chemical solution to the nozzle; and a solution supply unit to supply the chemical solution to the main supply unit or the auxiliary supply unit. Accordingly, the chemical solution may be supplied in various schemes. |
