发明名称 PROCESS, APPARATUS AND DEVICE
摘要 A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support for a patterning device, a substrate table for a substrate, a projection system, and a control system. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The projection system is configured to project the patterned radiation beam as an image onto a target portion of the substrate along a scan path. The scan path is defined by a trajectory in a scanning direction of an exposure field of the lithographic apparatus. The control system is coupled to the support, the substrate table and the projection system for controlling an action of the support, the substrate table and the projection system, respectively. The control system is configured to correct a local distortion of the image in a region along the scan path by a temporal adjustment of the image in that region, thereby reducing the intra-field overlay errors.
申请公布号 KR101418896(B1) 申请公布日期 2014.07.11
申请号 KR20070124004 申请日期 2007.11.30
申请人 发明人
分类号 H01L21/00;H01L21/027 主分类号 H01L21/00
代理机构 代理人
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