SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

摘要

Provided is a semiconductor device formed with a trench portion for providing a concave portion in a gate width direction and with a gate electrode provided within and on a top surface of the trench portion via a gate insulating film. At least a part of a surface of each of the source region and the drain region is made lower than other parts of the surface by removing a thick oxide film formed in the vicinity of the gate electrode. Making lower the part of the surface of each of the source region and the drain region allows current flowing through a top surface of the concave portion of the gate electrode at high concentration to flow uniformly through the entire trench portion, which increase an effective gate width of the concave portion formed so as to have a varying depth in a gate width direction.

主权项

1. A semiconductor device comprising:
a first conductivity type semiconductor substrate; a trench portion in the first conductivity type semiconductor substrate, the trench having a side surface and a bottom surface extending in a gate width direction; a concave surface region spaced away from the trench by a constant distance, such that the concave surface region follows a contour of the side surface of the trench; a gate electrode within the trench portion and overlying a planar portion of the substrate and spaced apart therefrom by a gate insulating film; a source region of a second conductivity type and a drain region of the second conductivity type in the substrate below the concave surface region, such that the source and drain regions are adjacent to the side surface of the trench and sandwich the electrode therebetween below the concave surface region.