发明名称 METHOD AND DEVICE FOR PROCESSING WAFER SHAPE ARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a method and a device for solving the cause of such problems as damage on a microstructure on the substrate surface and non-uniform cleaning, that the droplets of liquid spray are polydispersed.SOLUTION: Wet processing of a wafer shape article is improved by using a droplet generator designed to generate spray of monodispersed droplets. The droplet generator is attached to an upper part of a spin chuck, and is moved along a linear or arcuate path over the main surface of the wafer shape article. The droplet generator includes a converter coupled acoustically with the body so that the acoustic energy reaches a region of the body around a discharge orifice 150. Each orifice has at least a width w of 1-200 μm, and such a height h as the ratio to the w is 1 or less.
申请公布号 JP2014131033(A) 申请公布日期 2014.07.10
申请号 JP20130259825 申请日期 2013.12.17
申请人 LAM RESEARCH AG 发明人 FRANK HOLSTEYNS;ALEXANDER LIPPERT
分类号 H01L21/304;B05C5/00;B05C13/02;B08B3/10;H01L21/027 主分类号 H01L21/304
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