| 摘要 |
The invention provides a composition for forming a metal oxide-containing film comprising, as a component (A), a metal oxide-containing compound A1 obtained by hydrolysis and/or condensation of one or more kinds of hydrolysable metal compounds shown by the following general formula (A-1), as a component (B), an aromatic compound shown by the following general formula (B-1), the compound generating a hydroxyl group by thermal and/or an acid. There can be provided a composition for a resist lower layer film, which has high etching selectivity, capable of subjecting to stripping under mild conditions than the conventional process, has excellent pattern adhesiveness, and fine pattern formation can be performed.; |
| 主权项 |
1. A composition for forming a metal oxide-containing film comprising:
as a component (A), a metal oxide-containing compound A1 obtained by hydrolysis and/or condensation of one or more kinds of hydrolysable metal compounds shown by the following general formula (A-1),
L(OROA)a0(OR1A)a1(O)a2 (A-1)wherein, R0A and R1A represent an organic group having 1 to 30 carbon atoms; a0, a1 and a2 represent an integer of 0 or more and a0+a1+2×a2 is the same number as the number determined by valency of L; L is any of aluminum, gallium, yttrium, titanium, zirconium, hafnium, bismuth, tin, vanadium, and tantalum, as a component (B), an aromatic compound shown by the following general formula (B-1), the compound generating a hydroxyl group by thermal and/or an acid, wherein, d1 and d3 represent an integer of 1, 2 or 3; d2 represents an integer of 0, 1 or 2; E and G represent a single bond or a divalent organic group composed of one or more of carbon, oxygen and hydrogen atom; each D1, D2 and D3 may be the same or different and represents an organic group shown by the following general formula (B-1a) or (B-1b), wherein, each R1, R2 and R3 may be the same or different and represents an organic group shown by the following general formula (B-1c), (B-1d) or (B-1e); each R4, R5 and R6 may be the same or different and represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, and two alkyl groups may be bonded to form a cyclic substituent. wherein, Q1B to Q4B represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, and two substituents arbitrarily selected from Q1B to Q4B may be bonded to form a cyclic substituent; Q5B to Q7B represent an alkyl group having 1 to 20 carbon atoms, and two substituents arbitrarily selected from Q5B to Q7B may be bonded to form a cyclic substituent; and Q8B and Q9B represent an alkyl group having 1 to 20 carbon atoms, and Q8B and Q9B may be bonded each other to form a cyclic substituent. |
