发明名称 |
POLING TREATMENT METHOD, PLASMA POLING DEVICE, PIEZOELECTRIC BODY AND MANUFACTURING METHOD THEREOF, FILM FORMING DEVICE AND ETCHING DEVICE, AND LAMP ANNEALING DEVICE |
摘要 |
A plasma poling device includes a holding electrode (4) which is disposed in a poling chamber (1) and holds a substrate to be poled (2), an opposite electrode (7) which is disposed in the poling chamber and disposed facing the substrate to be poled held on the holding electrode, a power source (6) electrically connected to one electrode of the holding electrode and the opposite electrode, a gas supply mechanism supplying a plasma forming gas into a space between the opposite electrode and the holding electrode, and a control unit controlling the power source and the gas supply mechanism. The control unit controls the power source and the gas supply mechanism so as to form a plasma at a position facing the substrate to be poled and to apply a poling treatment to the substrate to be poled. |
申请公布号 |
US2014191618(A1) |
申请公布日期 |
2014.07.10 |
申请号 |
US201114123138 |
申请日期 |
2011.06.07 |
申请人 |
Kijima Takeshi;Honda Yuuji |
发明人 |
Kijima Takeshi;Honda Yuuji |
分类号 |
H01L41/257;B23K10/00;H01L21/324 |
主分类号 |
H01L41/257 |
代理机构 |
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代理人 |
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主权项 |
1. A poling treatment method for applying a poling treatment to a substrate to be poled at a first temperature, wherein
said first temperature is not lower than a temperature at which a residual polarization value in a hysteresis curve of said substrate to be poled becomes 0%. |
地址 |
Chiba JP |