发明名称 Method and Apparatus for Measuring Temperature of Semiconductor Layer
摘要 A method and apparatus are provided to directly and accurately detect a temperature of a semiconductor layer at the time of depositing and film-forming the semiconductor layer. First wavelength laser light having light transmissivity attenuated in a first temperature range and second wavelength laser light having light transmissivity attenuated in a second temperature range are applied to the semiconductor layer. A light receiving unit receives light passing through the semiconductor layer. An attenuation range of the laser light transmissivity is detected when the temperature of the semiconductor layer is increased and the detection light quantity of the first wavelength laser light is attenuated. As the temperature continues to increase and the detection light quantity of the second wavelength laser light exceeds an attenuation start point, the temperature of the semiconductor layer is calculated based on a detection light quantity at a predetermined measurement time and the attenuation range.
申请公布号 US2014192839(A1) 申请公布日期 2014.07.10
申请号 US201114126010 申请日期 2011.08.02
申请人 Lacroix Yves 发明人 Lacroix Yves
分类号 G01K7/01 主分类号 G01K7/01
代理机构 代理人
主权项 1. A temperature measuring method for measuring a temperature of a semiconductor layer during deposition in a chamber, comprising using a first wavelength light whose transmittance to the semiconductor layer starts to decrease as the temperature of the semiconductor layer rises and reaches a first range and a second wavelength light whose transmittance to the semiconductor layer starts to decrease as the temperature of the semiconductor layer reaches a second range that is higher than the first range, applying the first wavelength light and the second wavelength light to the semiconductor layer along a common path and detecting quantities of the first wavelength light and the second wavelength light with a light detecting device facing the semiconductor layer, and when the detected quantity of the second wavelength light starts to decrease after the temperature of the semiconductor layer exceeds the first range during which the detected quantity of the first wavelength light decreases, calculating a current temperature of the semiconductor layer within the second range from a current detected quantity of the second wavelength light and a decrease in the detected quantity of the first wavelength light.
地址 Tokushima JP