DESIGN OF INDUCTION COUPLING PLASMA SOURCE FOR IMPROVING PLASMA UNIFORMITY AND EFFECT

摘要

PROBLEM TO BE SOLVED: To provide an induction coupling plasma reactor in which at least a part of roof has an enclosure forming a dielectric window.SOLUTION: A substrate support is arranged in an enclosure under a dielectric window. An RF power applicator is disposed above the dielectric window, so as to apply an RF power in the enclosure through the dielectric window. A plurality of gas injection devices are distributed uniformly above the substrate support, so as to supply process gas into the enclosure. A circular baffle is arranged in the enclosure so as to limit process gas flow, and disposed above the substrate support but below the plurality of gas injection devices.