发明名称 PLATING PROCESS
摘要 A plated component and a plating process are disclosed. The plating process includes applying a material to a region of a component, the material being selected from the group consisting of nickel, cobalt, chromium, iron, aluminum, or a combination thereof. The region includes a single crystal microstructure, includes a directionally solidified microstructure, is substantially devoid of equiaxed microstructure, or a combination thereof. The applying includes electroplating, electroless plating, or the electroplating and the electroless plating. The plated component includes an electroplated region, an intermediate layer on the electroplated region, and an overlay coating on the intermediate layer.
申请公布号 US2014190834(A1) 申请公布日期 2014.07.10
申请号 US201313735293 申请日期 2013.01.07
申请人 GENERAL ELECTRIC COMPANY 发明人 CALLA Eklavya;ANAND Krishnamurthy;SHASTRY Chakrakody
分类号 B05D7/24;C25D3/02 主分类号 B05D7/24
代理机构 代理人
主权项 1. A process of plating, the process comprising: applying a material to a region of a component, the material being selected from the group consisting of nickel, cobalt, chromium, iron, aluminum, or a combination thereof; wherein the region includes a single crystal microstructure, includes a directionally solidified microstructure, is substantially devoid of equiaxed microstructure, or a combination thereof; wherein the applying includes at least one of electroplating and electroless plating.
地址 Schenectady NY US