| 摘要 |
<p>The present invention relates to a vacuum treatment apparatus which can treat a substrate under a vacuum condition. In particular, a reinforcing member is installed on the top of a gate valve, connected to one side of a process chamber body. One side of the reinforcing member is joined to one side of the top of an opening of the process chamber so as to prevent deformation of the opening of the process chamber. Through the opening of the process chamber, a substrate comes in and out. The gate valve can be tightly attached to the process chamber.</p> |
