| 摘要 |
Disclosed in the present invention are a high speed substrate inspecting apparatus which uses continuous light and improves a light processing speed, and a high speed substrate inspecting method using the same. The high speed substrate inspecting apparatus comprises: a substrate transfer unit which transfers a substrate; an optical module which allows the incidence of light toward the substrate, and obtains an image of the substrate using light reflected from the substrate; and an optical module transfer unit which supports the optical module and transfers the optical module. The optical module comprises: a light source which radiates light; an incidence optical system which guides the light to a transferred substrate; a first reflecting optical system which separates the light reflected from the substrate into first reflected light and second reflected light, and guides the first reflected light to a different path from the path of the second reflected light; a first optical sensor which detects the first reflected light; a second reflecting optical system which guides the second reflected light to a different path from the path of the first reflected light; a second optical sensor which detects the second reflected light; and a focus matching unit which regulates the focus of incidence light to the substrate using the first reflected light detected by the second optical sensor. |
