APPARATUS AND METHOD FDR TREATING SUBSTRATES

摘要

The present invention relates to a substrate processing apparatus and, more specifically, a substrate processing apparatus discharging a liquid chemical on the substrate while raising and supporting the substrate from a stage. The substrate processing apparatus according to an embodiment of the present invention comprises a substrate raising unit composed of a stage on which a substrate is processed and a pressure supplying member supplying gas or vacuum pressure to the upper part of the stage; a nozzle unit installed on the upper part of the stage and discharging the liquid chemical onto the substrate; and a substrate transfer unit transferring the substrate in a first direction by being composed of a guide rail which extends from both ends of the stage in the first direction and a holding member which holds the substrate and moves in the first direction on the upper side of the guide rail, wherein the holding member includes a plurality of holding parts supplying vacuum pressure to the upper part thereof.