DENDRITIC COMPOUNDS, PHOTORESIST COMPOSITIONS AND METHODS OF MAKING ELECTRONIC DEVICES

摘要

The present invention provides a dendritic compound. The dendritic compound of the present invention comprises: an anionic dendron with a focal point including an anionic group and a linking group; and a photoactive cation. The dendritic compound of the present invention has a specific use as a photoacid generator. Additionally, the present invention provides a photoresists including the dendritic compound and a method of manufacturing an electronic device with the photoresist composition. The dendritic compound, the photoresist composition and the method of the present invention exhibit specific applicability in semiconductor device manufacture.