ETCHANT COMPOSITION FOR AG THIN LAYER AND METHOD FOR FABRICATING METAL PATTERN USING THE SAME

摘要

The present invention relates to an etching solution composition including a heterocyclic compound having a carboxyl group for a single-layered film of silver or silver alloy, or a multi-layered film comprising a single-layered film of silver and an indium oxide film. When the single-layered film of silver or silver alloy, or the multi-layered film comprising the single-layered film of silver and the indium oxide film is etched, the etching solution composition of the present invention generates side etching in a small amount and uniformly etches the film without damaging a lower data wiring film and generating residues.