DEVICE AND SYSTEM FOR PROCESSING FLAT SUBSTRATES

摘要

The invention relates to a device for wetting flat substrates with a fluid on the underside of the substrates while the substrates pass along a transport path, said device comprising a wetting roller perpendicular to the transport direction, wherein the wetting roller extends to just before the transport plane from below and is immersed in a supply of fluid located therebelow. The device is an independently operable assembly together with the wetting roller and an elongated container for the fluid supply, which has an elongated design in the manner of a closed trough having an elongated opening at the top, which is substantially filled by the wetting roller. The wetting roller extends substantially within the container, wherein in a lower area, the container has drain openings at the bottom into a drain trough arranged below the container.