发明名称 PROCESS OF PREPARING A GAP FILLER AGENT, A GAP FILLER AGENT PREPARED USING SAME, AND A METHOD FOR MANUFACTURING SEMICONDUCTOR CAPACITOR USING THE GAP FILLER AGENT
摘要 Provided are a manufacturing method of a filler for filling a gap, comprising manufacturing hydrogenation polysilazane by putting 50-70 parts by weight of ammonia based on 100 parts by weight of halo-silane at a rate of 1 to 15 g/hr after injecting the halo-silane into an alkaline solvent, a filler for filling a gap manufactured by the manufacturing method, and a manufacturing method of a semiconductor capacitor using the same.
申请公布号 KR20140087978(A) 申请公布日期 2014.07.09
申请号 KR20130074682 申请日期 2013.06.27
申请人 CHEIL INDUSTRIES INC. 发明人 BAE, JIN HEE;LEE, HAN SONG;KWAK, TAEK SOO;KIM, GO UN;KIM, BO SUN;KIM, SANG KYUN;NA, YOONG HEE;PARK, EUN SU;SEO, JIN WOO;SONG, HYUN JI;LIM, SANG HAK;LIM, WAN HEE;HONG, SEUNG HEE;HWANG, BYEONG GYU
分类号 H01L21/31;H01L21/8242;H01L27/108 主分类号 H01L21/31
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