| 摘要 |
<p>The present invention relates to a deposition apparatus used for forming a thin film on a semiconductor, OLED, etc. The deposition apparatus using a roll type mask according to the present invention comprises: a deposition process chamber; a substrate support unit located in the deposition process chamber and on which a substrate is located; a continuous mask; a mask support unit to enable the supply and recovery of the continuous mask while both ends of the continuous mask are wound; and a deposition material supply device to supply a deposition material to the continuous mask in order for the deposition material to be deposited on the surface of the substrate in the deposition process chamber.</p> |
