COMPOSITION FOR FORMING SILICA BASED INSULATING LAYER COMPRISING SAME, SILICA BASED INSULATING LAYER AND METHOD FOR MANUFACTURING SILICA BASED INSULATING LAYER
摘要
Provided is a composition for forming a silica-based insulating layer which comprises a thermal base generator protected by a protective group decomposed by heat. The composition for forming a silica-based insulating layer reduces a shrinkage factor of a base material and reduces a shrinkage factor of the silica-base insulating layer, and improves the storage stability, when substituted to a dense silica glass by an oxidation reaction at a high temperature.
申请公布号
KR20140087644(A)
申请公布日期
2014.07.09
申请号
KR20120158167
申请日期
2012.12.31
申请人
CHEIL INDUSTRIES INC.
发明人
HONG, SEUNG HEE;SONG, HYUN JI;KIM, MI YOUNG;KWAK, TAEK SOO;KIM, GO UN;KIM, BONG HWAN;NA, YOONG HEE;PARK, EUN SU;BAE, JIN HEE;YUN, HUI CHAN;LEE, HAN SONG;LIM, SANG HAK;HAN, KWEN WOO;HWANG, BYEONG GYU