发明名称 COMPOSITION FOR FORMING SILICA BASED INSULATING LAYER COMPRISING SAME, SILICA BASED INSULATING LAYER AND METHOD FOR MANUFACTURING SILICA BASED INSULATING LAYER
摘要 Provided is a composition for forming a silica-based insulating layer which comprises a thermal base generator protected by a protective group decomposed by heat. The composition for forming a silica-based insulating layer reduces a shrinkage factor of a base material and reduces a shrinkage factor of the silica-base insulating layer, and improves the storage stability, when substituted to a dense silica glass by an oxidation reaction at a high temperature.
申请公布号 KR20140087644(A) 申请公布日期 2014.07.09
申请号 KR20120158167 申请日期 2012.12.31
申请人 CHEIL INDUSTRIES INC. 发明人 HONG, SEUNG HEE;SONG, HYUN JI;KIM, MI YOUNG;KWAK, TAEK SOO;KIM, GO UN;KIM, BONG HWAN;NA, YOONG HEE;PARK, EUN SU;BAE, JIN HEE;YUN, HUI CHAN;LEE, HAN SONG;LIM, SANG HAK;HAN, KWEN WOO;HWANG, BYEONG GYU
分类号 H01B3/46;C08L83/08 主分类号 H01B3/46
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