| 发明名称 |
PHOTORESIST STRIPPER COMPOSITION |
| 摘要 |
<p>The present invention relates to a photoresist stripper composition. A photoresist stripper composition according to one embodiment of the present invention includes an amino compound and a water-soluble organic solvent. According to the embodiment of the present invention, the photoresist stripper composition is formed on an organic insulating layer. According to the embodiment of the present invention, the photoresist stripper composition has excellent photoresist removal performance.</p> |
| 申请公布号 |
KR20140087758(A) |
申请公布日期 |
2014.07.09 |
| 申请号 |
KR20120158365 |
申请日期 |
2012.12.31 |
| 申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
KO, KYUNG JUN;KIM, SUNG SIK;KIM, JEONG HYUN |
| 分类号 |
H01L21/027;G03F7/42 |
主分类号 |
H01L21/027 |
| 代理机构 |
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| 地址 |
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