发明名称 METHOD FOR PRODUCING RELIEF PRINTING PLATE AND RINSING LIQUID FOR PRODUCTION OF RELIEF PRINTING PLATE
摘要 Provided is a process for making a relief printing plate in which a residue on the plate that is generated during engraving can be easily removed and a rinsing liquid for making a relief printing plate that is suitably used for the process for making a relief printing plate. A process for making a relief printing plate includes a step of preparing a relief printing plate precursor having a relief-forming layer, a step of engraving the relief printing plate precursor by exposure, and a step of removing an engraved residue generated by the engraving with a rinsing liquid in this order, wherein the rinsing liquid is an aqueous solution having a pH of 9 or higher, and wherein the engraved residue contains a polymer having a group represented by Formula (I) below. €ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ-M(R 1 )(R 2 ) n €ƒ€ƒ€ƒ€ƒ€ƒ(I) wherein R 1 denotes OR 3 or a halogen atom; M denotes Si, Ti, or Al; when M is Si, n is 2; when M is Ti, n is 2; when M is Al, n is 1; each of n of R 2 independently represents a hydrocarbon group, OR 3 , or a halogen atom; and R 3 denotes a hydrogen atom or a hydrocarbon group.
申请公布号 EP2468505(A4) 申请公布日期 2014.07.09
申请号 EP20100809906 申请日期 2010.08.12
申请人 FUJIFILM CORPORATION 发明人 TASHIRO HIROSHI;ADACHI KEIICHI
分类号 B41C1/05;B41N1/12;B41N3/06 主分类号 B41C1/05
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