发明名称 COMPOUND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A compound semiconductor device includes a substrate; a buffer layer formed on the substrate; an electron transit layer and an electron donating layer formed on the buffer layer; a gate electrode, a source electrode, and a drain electrode formed on the electron donating layer; and an embedded electrode to which a potential independent of the gate electrode, the source electrode, and the drain electrode is supplied to control a potential of the buffer layer.
申请公布号 KR101418205(B1) 申请公布日期 2014.07.09
申请号 KR20130006420 申请日期 2013.01.21
申请人 发明人
分类号 H01L21/338;H01L29/778 主分类号 H01L21/338
代理机构 代理人
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