CHEMICAL VAPOR DEPOSITION RAW MATERIAL COMPRISING ORGANOPLATINUM COMPOUND, AND CHEMICAL VAPOR DEPOSITION METHOD USING THE CHEMICAL VAPOR DEPOSITION RAW MATERIAL

摘要

A chemical vapor deposition raw material for producing a platinum thin film or a platinum compound thin film by a chemical vapor deposition method, wherein the chemical vapor deposition raw material includes an organoplatinum compound having cyclooctadiene and alkyl anions coordinated to divalent platinum, and the organoplatinum compound is represented by the following formula. Here, one in which R 1 and R 2 are any combination of propyl and methyl, propyl and ethyl, or ethyl and methyl is particularly preferred.
wherein R 1 and R 2 are alkyl groups, and R 1 and R 2 are different; and a number of carbon atoms of R 1 and R 2 is 3 to 5 in total.