| 发明名称 |
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<p>Provided in the present invention is a positive type photosensitive resin composition which comprises (A) an alkali-soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination of the same; (B) a photosensitive diazoquinone compound; (C) a multi-functional urethane (meth) acrylate compound; and (D) a solvent.</p> |
| 申请公布号 |
KR20140087645(A) |
申请公布日期 |
2014.07.09 |
| 申请号 |
KR20120158168 |
申请日期 |
2012.12.31 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
KWON, JI YUN;KIM, SANG SOO;YOON, EUN KYUNG;LEE, JONG HWA;LEE, JUN HO;LEE, JIN YOUNG;CHO, HYUN YONG;HWANG, EUN HA |
| 分类号 |
G03F7/039;G03F7/022;G03F7/09;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
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